Nwifior K. & Ifeanyichukwu B. J.
Department of physics, Ebonyi State College of Education, Ikwo, Ebonyi State, Nigeria.
Email: Nwifiokele@gmail.com 08068396009.
Abstract.
The solution growth technique was used to deposit ternary thin film on substrates at different bath parameters which include temperature, concentration of solution, volume of solution and water, time of deposition and pH, from bath composition of aluminum chloride (AlCl), Nickle Chloride (NiCl 6HO), 3 2 2 thiourea (CS(NH), distilled water, ethylene diamine tetracetic acid (EDTA) and 2 2 ammonia (NH). Ethylene diamine tetra acetic acid and ammonia served as the 3 complexing agents. A UN-VIS-NIR spectrophotometer was used to measure transmittance, while absorbance and reflectance were determined by calculation. The GBC enhanced mini material analyzer (EMMA) X-ray diffractometer was used to measure the elemental compositions of the films. The optical properties revealed that films of Aluminum Nickel sulphide (Al NiS) 4.5 7 3 have high absorbance and reflectance but moderate transmittance throughout the ultraviolet, visible and infrared regions. The above results show that Al NiS 4.5 7 3 could be applied in solar cells, photo-thermal solar energy devices etc. It could also be used as anti-reflection coatings.
Key words: solution growth technique, optical properties, anti-reflection coatings.
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